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Welcome to the CATRENE project EXEPT
The goal of the CATRENE project EXEPT (
EX
treme uv lithography
E
ntry
P
oint
T
echnology development) is to develop technologies, tool & infrastructures components as required for high volume EUV lithography for 22nm node in 2012. The project aims with the expected introduction of EUV lithography in high volume semiconductor production lines at opening new business opportunities for the participating companies
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